Nanofabrication Limits in Layered Ferroelectric Semiconductors via He-ion Beam
نویسندگان
چکیده
1. Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN 37831 2. The Institute for Functional Imaging of Materials, Oak Ridge National Laboratory, Oak Ridge, TN 37831 3. Department of Materials Science and Engineering, University of Tennessee, Knoxville, Knoxville TN 37996 4. Materials Sciences and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831
منابع مشابه
Nanofabrication and Spectroscopy of Magnetic Nanostructures Using a Focused Ion Beam
DOI: 10.25148/etd.FIDC000785 Follow this and additional works at: http://digitalcommons.fiu.edu/etd Part of the Biological Factors Commons, Biology and Biomimetic Materials Commons, Biomedical Devices and Instrumentation Commons, Chemical and Pharmacologic Phenomena Commons, Circulatory and Respiratory Physiology Commons, Electrical and Electronics Commons, Electromagnetics and Photonics Common...
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